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       The spectroscopic ellipsometer is used for thin film and material characterization in R & D. The spectroscopic ellipsometer is designed to meet the requirements in modern research with special emphasis on speed and accuracy for an unmatched variety of applications.

 

Product's Feature:
■Thin film thickness

■Reflection 

■Transmission

■Refractive index

■Absorption

■Material composition

■Index gradient

■More simple and efficient method of sample alignment 

■Experimental data and simulated data with 3D graphics

■Powerful spectroscopic ellipsometry measurement and analysis software

 

Technique Specification:
■Wavelength range :350-850nm, 250-1100nm, 190-1700nm: 0.002 ° ~ 0.02 ° 

■Wavelength accuracy: 1nm 

■Measuring time: <8s (depending on measurement mode and roughness) 

■Sample size: 125x125mm 156x156mm, 200x200mm cells, other sizes 

■Accuracy: 0.02nm 

■Refraction rate: 0.0002, 100nmSiO2 on Si 

■Angle accuracy: 0.01

■Thickness range 0.01 nm - 50,000 nm

■Extinction ratio : 10-6

 
Typical Customer: 

American,Europe and Asia and so on.